A Rapid Modeling Technique for Measurable Improvements in Factory Performance

Andreas Peikert, Steven Brown, Josef Thoma


This paper discusses a methodology for quickly investigating problem areas in semiconductor wafer fabrication factories by creating a model for the production area of interest only (as opposed to a model of the complete factory operation). All other factory operations are treated as "black boxes". Specific assumptions are made to capture the effect of reentrant flow. This approach allows a rapid response to production questions when beginning a new simulation project. The methodology was applied to a cycle-time and capacity analysis of the photolithography operation for Infineon's Dresden wafer fab. The results of this simulation study are presented.

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