Wright Williams & Kelly

DuPont Photomasks to Optimize
Equipment Purchases Utilizing WWK's

July 1, 1998 (Pleasanton, CA) - Wright Williams & Kelly (WWK) announced today that DuPont Photomasks, Inc. (NASDAQ: DPMI), the world's largest producer of photomasks to the semiconductor industry, has licensed WWK's cost of ownership (COO) and overall equipment effectiveness (OEE) software, TWO COOL®. DuPont Photomasks becomes the first photomask producer to leverage the work done between WWK and consortium based advanced photomask research organizations.

"DuPont Photomasks is committed to continuously improving the effectiveness of our operations in order to deliver highly valued products to our customers," stated Mr. Harold Lehon, Director of Global Manufacturing Optimization for DuPont Photomasks. "TWO COOL® provides an analytical tool which will help us in working with our suppliers to improve equipment performance and ultimately reduce our total cost of ownership. As the world's leading photomask producer, we are delighted to work with WWK in becoming the first company in this industry to benefit from the use of this powerful tool."

Commenting on the purchase, David Jimenez, WWK's Vice President and General Manager stated, "Photomask equipment suppliers have lagged their wafer fab counterparts in aggressively adopting strict COO techniques. With DuPont Photomasks leading the industry, I expect to see equipment suppliers to the photomask industry very quickly closing that gap. We believe this purchase reflects confidence in our products, as well as the growing importance of cost analysis in advanced photomask manufacturing."


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